-
2
-
-
33746339217
-
Emerging memory devices
-
IEEE
-
Galatsis, K., et al., Emerging memory devices. Circuits and Devices Magazine, IEEE, 2006. 22(3): p. 12-21.
-
(2006)
Circuits and Devices Magazine
, vol.22
, Issue.3
, pp. 12-21
-
-
Galatsis, K.1
-
3
-
-
55449122987
-
Overview of candidate device technologies for storage-class memory
-
Burr, G.W., et al., Overview of candidate device technologies for storage-class memory. IBM J. Res. Dev., 2008. 52(4): p. 449-464.
-
(2008)
IBM J. Res. Dev.
, vol.52
, Issue.4
, pp. 449-464
-
-
Burr, G.W.1
-
4
-
-
70350608599
-
After hard drives - What comes next?
-
Kryder, M.H. and C.S. Kinm, After hard drives - what comes next? Magnetics, IEEE Transactions on, 2009. 45(10): p. 3406-3413.
-
(2009)
Magnetics, IEEE Transactions on
, vol.45
, Issue.10
, pp. 3406-3413
-
-
Kryder, M.H.1
Kinm, C.S.2
-
6
-
-
77952325703
-
Phase change memory technology for embedded non volatile memory applications for 90 nm and beyond
-
R. Annunziata, P.Z., M. Borghi, G. De Sandre, L. Scotti, C. Prelini, M. Tosi, I. Tortorelli, F. Pellizzer. Phase change memory technology for embedded non volatile memory applications for 90 nm and beyond. in Electron Devices Meeting, 2009. IEDM '09 Technical Digest. IEEE International. 2009.
-
(2009)
Electron Devices Meeting, 2009. IEDM '09 Technical Digest. IEEE International
-
-
Annunziata, R.1
Z, P.2
Borghi, M.3
De Sandre, G.4
Scotti, L.5
Prelini, C.6
Tosi, M.7
Tortorelli, I.8
Pellizzer, F.9
-
8
-
-
75749146203
-
Synthesis and size-dependent crystallization of colloidal germanium telluride nanoparticles
-
Caldwell, M.A., et al., Synthesis and size-dependent crystallization of colloidal germanium telluride nanoparticles. Journal of Materials Chemistry, 2010. 20(7): p. 1285-1291.
-
(2010)
Journal of Materials Chemistry
, vol.20
, Issue.7
, pp. 1285-1291
-
-
Caldwell, M.A.1
-
10
-
-
34547767049
-
Analysis of temperature in phase change memory scaling
-
Kim, S. and H.-S.P. Wong, Analysis of temperature in phase change memory scaling. IEEE Electron Device Letters, 2007. 28(8): p. 697-699.
-
(2007)
IEEE Electron Device Letters
, vol.28
, Issue.8
, pp. 697-699
-
-
Kim, S.1
Wong, H.-S.P.2
-
13
-
-
39549112173
-
Highly Reliable 256Mb PRAM with Advanced Ring Contact Technology and Novel Encapsulating Technology
-
Song, Y.J., et al. Highly Reliable 256Mb PRAM with Advanced Ring Contact Technology and Novel Encapsulating Technology. in VLSI Technology, 2006. Digest of Technical Papers. 2006 Symposium on. 2006.
-
(2006)
VLSI Technology, 2006. Digest of Technical Papers. 2006 Symposium on
-
-
Song, Y.J.1
-
15
-
-
34948907947
-
Highly scalable non-volatile and ultra-low-power phase-change nanowire memory
-
Lee, S.-H., Y. Jung, and R. Agarwal, Highly scalable non-volatile and ultra-low-power phase-change nanowire memory. Nat Nano, 2007. 2(10): p. 626-630.
-
(2007)
Nat Nano
, vol.2
, Issue.10
, pp. 626-630
-
-
Lee, S.-H.1
Jung, Y.2
Agarwal, R.3
-
17
-
-
55449106208
-
Phase-change random access memory: A scalable technology
-
Raoux, S., et al., Phase-change random access memory: a scalable technology. IBM J. Res. Dev., 2008. 52(4): p. 465-479.
-
(2008)
IBM J. Res. Dev.
, vol.52
, Issue.4
, pp. 465-479
-
-
Raoux, S.1
-
18
-
-
47349131110
-
Threshold switching mechanism by high-field energy gain in the hopping transport of chalcogenide glasses
-
Ielmini, D., Threshold switching mechanism by high-field energy gain in the hopping transport of chalcogenide glasses. Physical Review B, 2008. 78: p. 035308.
-
(2008)
Physical Review B
, vol.78
, pp. 035308
-
-
Ielmini, D.1
-
19
-
-
44049087109
-
Temperature acceleration of structural relaxation in amorphous Ge2Sb2Te5
-
Ielmini, D., et al., Temperature acceleration of structural relaxation in amorphous Ge2Sb2Te5. Applied Physics Letters, 2008. 92(19): p. 193511.
-
(2008)
Applied Physics Letters
, vol.92
, Issue.19
, pp. 193511
-
-
Ielmini, D.1
-
20
-
-
2442604559
-
Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials
-
Pirovano, A., et al., Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials. Electron Devices, IEEE Transactions on, 2004. 51(5): p. 714-719.
-
(2004)
Electron Devices, IEEE Transactions on
, vol.51
, Issue.5
, pp. 714-719
-
-
Pirovano, A.1
-
21
-
-
34548647299
-
Analytical model for subthreshold conduction and threshold switching in chalcogenide-based memory devices
-
Ielmini, D. and Y. Zhang, Analytical model for subthreshold conduction and threshold switching in chalcogenide-based memory devices. Journal of Applied Physics, 2007. 102(5): p. 054517-13.
-
(2007)
Journal of Applied Physics
, vol.102
, Issue.5
, pp. 54517-54613
-
-
Ielmini, D.1
Zhang, Y.2
-
23
-
-
45149131679
-
Crystallization properties of ultrathin phase change films
-
Raoux, S., J.L. Jordan-Sweet, and A.J. Kellock, Crystallization properties of ultrathin phase change films. Journal of Applied Physics, 2008. 103(11): p. 114310-114310-7.
-
(2008)
Journal of Applied Physics
, vol.103
, Issue.11
-
-
Raoux, S.1
Jordan-Sweet, J.L.2
Kellock, A.J.3
-
24
-
-
67650102619
-
Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges
-
Waser, R., et al., Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges. Advanced Materials, 2009. 21(25-26): p. 2632-+.
-
(2009)
Advanced Materials
, vol.21
, Issue.25-26
-
-
Waser, R.1
-
25
-
-
65249161894
-
Electrical Manipulation of Nanofilaments in Transition-Metal Oxides for Resistance-Based Memory
-
Lee, M.-J., et al., Electrical Manipulation of Nanofilaments in Transition-Metal Oxides for Resistance-Based Memory. Nano Letters, 2009. 9(4): p. 1476-1481.
-
(2009)
Nano Letters
, vol.9
, Issue.4
, pp. 1476-1481
-
-
Lee, M.-J.1
-
26
-
-
70350057158
-
Optimized Ni Oxidation in 80-nm Contact Holes for Integration of Forming-Free and Low-Power Ni/NiO/Ni Memory Cells
-
Goux, L., et al., Optimized Ni Oxidation in 80-nm Contact Holes for Integration of Forming-Free and Low-Power Ni/NiO/Ni Memory Cells. Ieee Transactions on Electron Devices, 2009. 56(10): p. 2363-2368.
-
(2009)
Ieee Transactions on Electron Devices
, vol.56
, Issue.10
, pp. 2363-2368
-
-
Goux, L.1
-
28
-
-
77952328469
-
Highly Scalable Hafnium Oxide Memory with Improvements of Resistive Distribution and Read Disturb Immunity
-
Chen, Y.S., et al., Highly Scalable Hafnium Oxide Memory with Improvements of Resistive Distribution and Read Disturb Immunity. 2009 IEEE International Electron Devices Meeting (IEDM 2009), 2009: p. 1-4.
-
(2009)
2009 IEEE International Electron Devices Meeting (IEDM 2009)
, pp. 1-4
-
-
Chen, Y.S.1
-
29
-
-
70449393681
-
A 5 ns fast write multi-level non-volatile 1 K bits RRAM memory with advance write scheme
-
Sheu, S.-S., et al., A 5 ns fast write multi-level non-volatile 1 K bits RRAM memory with advance write scheme. 2009 Symposium on VLSI Circuits, 2009: p. 82-3.
-
(2009)
2009 Symposium on VLSI Circuits
, pp. 82-83
-
-
Sheu, S.-S.1
-
30
-
-
69549126428
-
Threshold field of phase change memory materials measured using phase change bridge devices
-
Krebs, D., et al., Threshold field of phase change memory materials measured using phase change bridge devices. Applied Physics Letters, 2009. 95(8): p. 082101.
-
(2009)
Applied Physics Letters
, vol.95
, Issue.8
, pp. 082101
-
-
Krebs, D.1
-
31
-
-
21644443347
-
Highly scalable nonvolatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses
-
Baek, I.G., et al. Highly scalable nonvolatile resistive memory using simple binary oxide driven by asymmetric unipolar voltage pulses. in Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International. 2004.
-
(2004)
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
-
-
Baek, I.G.1
-
33
-
-
46049092606
-
Excellent uniformity and reproducible resistance switching characteristics of doped binary metal oxides for non-volatile resistance memory applications
-
Lee, D., et al. Excellent uniformity and reproducible resistance switching characteristics of doped binary metal oxides for non-volatile resistance memory applications. in Electron Devices Meeting, 2006. IEDM '06. International. 2006.
-
(2006)
Electron Devices Meeting, 2006. IEDM '06. International
-
-
Lee, D.1
-
34
-
-
50249156872
-
Low power and high speed switching of Ti-doped NiO ReRAM under the unipolar voltage source of less than 3 V. 2007
-
Tsunoda, K., et al., Low power and high speed switching of Ti-doped NiO ReRAM under the unipolar voltage source of less than 3 V. 2007 IEEE International Electron Devices Meeting - IEDM '07, 2007: p. 767-70.
-
(2007)
IEEE International Electron Devices Meeting - IEDM '07
, pp. 767-770
-
-
Tsunoda, K.1
-
35
-
-
64549160578
-
x ReRAM and direct evidence of redox reaction mechanism
-
Technical Digest
-
x ReRAM and direct evidence of redox reaction mechanism. IEDM 2008. IEEE International Electron Devices Meeting. Technical Digest, 2008: p. 1-4.
-
(2008)
IEDM 2008. IEEE International Electron Devices Meeting
, pp. 1-4
-
-
Wei, Z.1
-
36
-
-
71049158037
-
NiO resistance change memory with a novel structure for 3D integration and improved confinement of conduction path
-
Lee, B. and H.S.P. Wong. NiO resistance change memory with a novel structure for 3D integration and improved confinement of conduction path. in VLSI Technology, 2009 Symposium on. 2009.
-
(2009)
VLSI Technology, 2009 Symposium on
-
-
Lee, B.1
Wong, H.S.P.2
-
38
-
-
77957010403
-
Cross-Point Memory Array without Cell Selectors - Device Characteristics and Data Storage Pattern Dependencies
-
p. accepted for publication
-
Liang, J. and H.S.P. Wong, Cross-Point Memory Array without Cell Selectors - Device Characteristics and Data Storage Pattern Dependencies. IEEE Trans. Electron Devices, 2010: p. accepted for publication.
-
(2010)
IEEE Trans. Electron Devices
-
-
Liang, J.1
Wong, H.S.P.2
|