Comparison of electrostatic and electromagnetic simulations for very high frequency plasmas

Physics of Plasmas

Volumn 17, Issue 11, 2010, Pages

  Zhang, Yu Ru ^a   Xu, Xiang ^a   Zhao, Shu Xia ^a,b   Bogaerts, A ^b   Wang, You Nian ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITY OF ANTWERP   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; CONSTANT FREQUENCY; DENSITY PROFILE; DIFFERENT DISTRIBUTIONS; DISCHARGE CHARACTERISTICS; DISCHARGE CONDITIONS; EDGE EFFECT; ELECTROMAGNETIC EFFECTS; ELECTROMAGNETIC MODELS; ELECTROMAGNETIC SIMULATION; ELECTROSTATIC MODELS; EXCITATION SOURCES; FLUID MODELS; HIGH FREQUENCY; IONIZATION RATES; PLASMA CHARACTERISTICS; PRESSURE INCREASE; STANDING WAVE EFFECTS; VERY HIGH FREQUENCY; VERY HIGH FREQUENCY PLASMA;

ARGON; ELECTRIC DISCHARGES; ELECTROSTATICS; MAGNETIC MATERIALS; MAGNETOELECTRIC EFFECTS; MAXWELL EQUATIONS; MICROCRYSTALLINE SILICON; PLASMA DENSITY; PLASMA JETS; PLASMAS; PRESSURE EFFECTS;

ELECTROMAGNETISM;

EID: 78650261577     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3519515     Document Type: Article

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