Self-consistent simulation of very high frequency capacitively coupled plasmas

Plasma Sources Science and Technology

Volumn 17, Issue 3, 2008, Pages

  Rauf, Shahid ^a   Bera, Kallol ^a   Collins, Ken ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; MAXWELL EQUATIONS; TWO DIMENSIONAL;

CAPACITIVELY COUPLED PLASMAS; INTER-ELECTRODE GAPS; RADIO FREQUENCY SOURCES; TWO-DIMENSIONAL PLASMA; VERY HIGH-FREQUENCY;

PLASMAS;

EID: 51849151553     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/3/035003     Document Type: Article

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