|
|
Volumn 19, Issue 5, 2010, Pages
|
|
Modeling of dual frequency capacitively coupled plasma sources utilizing a full-wave Maxwell solver: II. Scaling with pressure, power and electronegativity
a,c
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
CAPACITIVELY COUPLED PLASMAS;
COMPUTATIONAL INVESTIGATION;
DESTRUCTIVE INTERFERENCE;
DUAL FREQUENCY;
ELECTRON DENSITIES;
ELECTRON ENERGY DISTRIBUTIONS;
ELECTRONEGATIVE GAS;
FULL-WAVE SOLUTIONS;
HIGH FREQUENCY;
ION ACCELERATIONS;
ION ENERGY DISTRIBUTIONS;
IONIZATION SOURCES;
LOW FREQUENCY;
MAXWELL'S EQUATIONS;
MICROELECTRONICS FABRICATION;
POWER DEPOSITION;
REACTIVE FLUX;
SINGLE FREQUENCY;
SPATIAL DISTRIBUTION;
SPATIAL VARIATIONS;
WAFER SIZES;
ELECTRIC FIELDS;
ELECTRIC POWER DISTRIBUTION;
ELECTROMAGNETIC WAVES;
INDUCTIVELY COUPLED PLASMA;
IONIZATION OF GASES;
IONS;
MICROELECTRONICS;
PLASMA DEPOSITION;
PLASMA SOURCES;
WAVE EFFECTS;
WAVE EQUATIONS;
MAXWELL EQUATIONS;
|
|
EID: 78149306024
PISSN: 09630252
EISSN: 13616595
Source Type: Journal
DOI: 10.1088/0963-0252/19/5/055012 Document Type: Article |
|
Times cited : (84)
|
|
References (15)
|
