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Volumn 13, Issue 3, 2004, Pages 436-445
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Experimental and numerical studies on voltage distribution in capacitively coupled very high-frequency plasmas
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Author keywords
[No Author keywords available]
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Indexed keywords
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);
PLASMA REACTORS;
VERY HIGH-FREQUENCY (VHF);
VOLTAGE DISTRIBUTION;
CARRIER CONCENTRATION;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
ELECTRIC POTENTIAL;
NUMERICAL ANALYSIS;
THIN FILMS;
WAVE PROPAGATION;
PLASMA SOURCES;
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EID: 4444293704
PISSN: 09630252
EISSN: None
Source Type: Journal
DOI: 10.1088/0963-0252/13/3/010 Document Type: Article |
Times cited : (22)
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References (12)
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