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Volumn 13, Issue 3, 2004, Pages 436-445

Experimental and numerical studies on voltage distribution in capacitively coupled very high-frequency plasmas

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); PLASMA REACTORS; VERY HIGH-FREQUENCY (VHF); VOLTAGE DISTRIBUTION;

EID: 4444293704     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/3/010     Document Type: Article
Times cited : (22)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.