Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1425-1430

  Sansonnens, L ^a   Schmidt, H ^a   Howling, A A ^a   Hollenstein, Ch ^a   Ellert, Ch ^b   Buechel, A ^b  

^a EPFL   (Switzerland)

^b Balzers AG   (Liechtenstein)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; ELECTROMAGNETIC WAVES; INDUSTRIAL APPLICATIONS;

CAPACITIVELY COUPLED PLASMA; CONDUCTING SUBSTRATE; LARGE AREA REACTORS; STANDING WAVE;

INDUCTIVELY COUPLED PLASMA;

EID: 33745507998     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2189266     Document Type: Article

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