Frequency dependent plasma characteristics in a capacitively coupled 300 mm wafer plasma processing chamber

Plasma Sources Science and Technology

Volumn 15, Issue 4, 2006, Pages 879-888

  Hebner, Gregory A ^a   Barnat, Edward V ^a   Miller, Paul A ^a   Paterson, Alex M ^b   Holland, John P ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARRIER CONCENTRATION; FUNCTION EVALUATION; LIGHT EMISSION; NONLINEAR SYSTEMS;

ARGON PLASMA; ION SATURATION CURRENTS; PLASMA PROCESSING SYSTEMS; WAFER PLASMA;

PLASMA PROBES;

EID: 33750586214     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/4/035     Document Type: Article

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