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Volumn 43, Issue 15, 2010, Pages

Graded conductivity electrodes as a means to improve plasma uniformity in dual frequency capacitively coupled plasma sources

(2) Yang, Yang a,c Kushner, Mark J b

a Iowa State University of Science and Technology (United States)

b UNIVERSITY OF MICHIGAN (United States)

c APPLIED MATERIALS INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; CONSTRUCTIVE INTERFERENCE; DIRECT CONTACT; DUAL FREQUENCY; E-M WAVES; HIGH FREQUENCY; ION ACCELERATIONS; LOW FREQUENCY; METAL ELECTRODES; MICROELECTRONICS FABRICATION; PLASMA UNIFORMITY; POWER DEPOSITION; WAFER SIZES;

ELECTRIC FIELDS; ELECTRODES; ELECTROMAGNETIC WAVES; FLUORESCENCE; INDUCTIVELY COUPLED PLASMA; MICROELECTRONICS;

PLASMA DEPOSITION;

EID: 77950570034 PISSN: 00223727 EISSN: 13616463 Source Type: Journal
DOI: 10.1088/0022-3727/43/15/152001 Document Type: Article

Times cited : (39)

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