Experimental study of plasma non-uniformities and the effect of phase-shift control in a very high frequency capacitive discharge

Journal of Physics D: Applied Physics

Volumn 43, Issue 8, 2010, Pages

  Volynets, Vladimir ^a   Shin, Hansoo ^a   Kang, Dongwoo ^a   Sung, Dougyong ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

300 MM WAFERS; BOTTOM ELECTRODES; CAPACITIVE DISCHARGES; CONTROLLED PHASE SHIFT; ELECTROMAGNETIC EFFECTS; EXPERIMENTAL CONDITIONS; EXPERIMENTAL STUDIES; HIGH-POWER; IN-PROCESS; LOW POWER; MODE OF OPERATIONS; NON-UNIFORMITIES; NONUNIFORMITY; PHASE SHIFT CONTROL; PLASMA UNIFORMITY; STANDING WAVE EFFECTS; VERY HIGH FREQUENCY;

FEATURE EXTRACTION; PHASE SHIFT; PLASMA DENSITY; PLASMAS;

ELECTRIC DISCHARGES;

EID: 77149139447     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/8/085203     Document Type: Article

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