Calculation of the electrode shape for suppression of the standing wave effect in large area rectangular capacitively coupled reactors

Journal of Applied Physics

Volumn 97, Issue 6, 2005, Pages

  Sansonnens, L ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC SKIN DEPTH; EXCITATION FREQUENCY; GAUSSIAN SHAPED ELECTRODES; STANDING WAVE EFFECT;

ELECTRODES; ETCHING; MAGNETOELECTRIC EFFECTS; MAXWELL EQUATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

PLASMA THEORY;

EID: 20444485323     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1862770     Document Type: Article

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