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Volumn 15, Issue 4, 2006, Pages 889-899

Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC REACTORS; MAGNETIC FIELDS; PLASMA INTERACTIONS; PLASMA SHEATHS; SURFACE WAVES; WAVE PROPAGATION;

EID: 33750599441     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/4/036     Document Type: Article
Times cited : (61)

References (21)
  • 9
    • 0002215719 scopus 로고    scopus 로고
    • Riley M E 1995 Unified model of the rf plasma sheath Technical Report SAND95-0775 UC-401 (Sandia National Laboratories)
    • (1995) Technical Report
    • Riley, M.E.1
  • 10
    • 0002215719 scopus 로고    scopus 로고
    • Riley M E 1996 Unified model of the rf plasma sheath part II-asymptotic connection formulae Technical Report SAND96-1948 UC-401 (Sandia National Laboratories)
    • (1996) Technical Report
    • Riley, M.E.1
  • 13
    • 0010290199 scopus 로고
    • Magnetic probes
    • Loveberg R H 1969 Magnetic probes Plasma Diagnostic Techniques ed R H Huddlestone and S L Leonard (New York: Academic) p 69-112
    • (1969) Plasma Diagnostic Techniques , pp. 69-112
    • Loveberg, R.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.