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Volumn 15, Issue 4, 2006, Pages 889-899
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Spatial and frequency dependence of plasma currents in a 300 mm capacitively coupled plasma reactor
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRIC REACTORS;
MAGNETIC FIELDS;
PLASMA INTERACTIONS;
PLASMA SHEATHS;
SURFACE WAVES;
WAVE PROPAGATION;
CAPACITIVELY COUPLED PLASMA REACTORS;
EXCITATION CIRCUITS;
PLASMA CURRENTS;
PLASMA PROCESSING CHAMBERS;
PLASMA FLOW;
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EID: 33750599441
PISSN: 09630252
EISSN: 13616595
Source Type: Journal
DOI: 10.1088/0963-0252/15/4/036 Document Type: Article |
Times cited : (61)
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References (21)
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