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Journal of Applied Physics

Volumn 106, Issue 3, 2009, Pages

Control of plasma uniformity in a capacitive discharge using two very high frequency power sources

(4) Bera, Kallol a Rauf, Shahid a Ramaswamy, Kartik a Collins, Ken a

a APPLIED MATERIALS INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOTTOM ELECTRODES; CAPACITIVE DISCHARGES; CAPACITIVELY COUPLED PLASMAS; COMPUTATIONAL MODELING; DIELECTRIC ETCHING; ELECTRON DENSITIES; ELECTROSTATIC EFFECT; HIGH-ELECTRON-DENSITY; ION FLUXES; ION SATURATION CURRENT; LANGMUIR PROBE MEASUREMENTS; PLASMA CHARACTERISTICS; PLASMA POTENTIAL; PLASMA UNIFORMITY; POTENTIAL FORMULATIONS; RF SOURCES; SPATIAL PROFILES; TWO-DIMENSIONAL PLASMA; VERY HIGH FREQUENCY; VERY HIGH FREQUENCY POWER;

CARRIER CONCENTRATION; ELECTRON DENSITY MEASUREMENT; ELECTRONS; INDUCTIVELY COUPLED PLASMA; MAXWELL EQUATIONS;

ELECTRIC DISCHARGES;

EID: 69149087968 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3183946 Document Type: Article

Times cited : (44)

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