Photocatalytic activity of doped TiO2 coatings prepared by sputtering deposition

Journal of Materials Processing Technology

Volumn 192-193, Issue , 2007, Pages 60-67

  Chiu, Sung Mao ^a,b   Chen, Zhi Sheng ^b   Yang, Kuo Yuan ^b   Hsu, Yu Lung ^c   Gan, Dershin ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^b METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

^c NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Nitrogen doping; Photocatalytic activity; Physical vapor deposition; Titanium oxide

Indexed keywords

ENERGY GAP; MAGNETRON SPUTTERING; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; TITANIUM DIOXIDE; AROMATIC COMPOUNDS; DEGRADATION; DEPOSITION; NITROGEN; OXIDE FILMS; PHYSICAL VAPOR DEPOSITION; TITANIUM; TITANIUM OXIDES; X RAY DIFFRACTION;

CRYSTALLINITY; FLOW RATIO; METHYLENE BLUE; POROUS SURFACE MORPHOLOGY;

OXIDE FILMS; SEMICONDUCTOR DOPING;

DC REACTIVE MAGNETRON SPUTTERING; GRAZING INCIDENCE X-RAY DIFFRACTION; METHYLENE BLUE SOLUTION; NITROGEN-DOPED TITANIUM OXIDES; NITROGEN-DOPING; PHOTOCATALYTIC ACTIVITIES; PREFERRED ORIENTATIONS; UV-VIS-NIR SPECTROPHOTOMETERS;

EID: 34547548236     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmatprotec.2007.04.031     Document Type: Article

References (24)

1. Wunderlich W., Oekermann T., Miao L., Hue N.T., Tanemura S., and Tanemura M. J. Ceramic Proc. Res. 5 4 (2004) 343-354
2. Inoue N., Yuasa H., and Okoshi M. Appl. Sci. Sci. 197-198 (2002) 393-397
3. Fang J.H., Lu X.M., Zhang X.F., Fu D.G., and Lu Z.H. Supramol. Sci. 5 5-6 (1998) 709-711
4. Nakajima A., Hayashi N., Taniguchi Y., Kameshima Y., and Okada K. Surf. Coat. Technol. 192 (2005) 112-116
5. Wang X.Y., Liu Z., Klein D., and Coddet C. Thin Solid Films 451-452 (2004) 37-42
6. Ding Z., Hu X.J., Yue P.L., Lu G.Q., and Greenfield P.F. Catal. Today 68 (2001) 173-182
7. Zhang W., Li Y., Zhu S., and Wang F. Surf. Coat. Technol. 182 (2004) 192-198
8. Mardare D., Tasca M., Delibas M., and Rusu G.I. Appl. Sci. Sci. 156 (2000) 200-206
9. Zakrzewska K., Radecka M., Kruk A., and Osuch W. Thin Solid Films 157 (2003) 349-356
10. Zheng S.K., Wang T.M., Wang C., and Xiang G. Nucl. Instr. Meth. B 187 (2002) 479-484
11. Asahi R., Morikawa T., Ohwaki T., Aoki K., and Taga y. Science 293 (2001) 269-271
12. Suda Y., Kawasaki H., Ueda T., and Ohshima T. Thin Solid Films 453-454 (2004) 162-166
13. Mohamed S.H., Kappertz O., Niemeier T., Drese R., Wakkad M.M., and Wuttig M. Thin Solid Films 468 (2004) 48-56
14. 2 phase.
15. Park B., Jung D.H., Lee G., Lee J.J., and Joo J.H. Surf. Coat. Technol. 174/175 (2003) 643-647
16. Hukari K., Dannenberg R., and Stach E.A. J. Mater. Res. 17 (2002) 550
17. Shannon R.D. Acta Crystallogr. A32 (1976) 751-767
18. Zeman P., and Takabayashi S. Thin Solid Films 433 (2003) 57-62
19. Yamagishi M., Kuriki S., Song P.K., and Shigesato Y. Thin Solid Films 442 (2003) 227-231
20. Meng L.J., and dos Santos M.P. Thin Solid Films 226 (1993) 22-29
21. Syarif D.G., Miyashita A., Yamaki T., Sumita T., Choi Y., and Itoh H. Appl. surf. Sci. 193 (2002) 287-292
22. Tauc J. Mater. Res. Bull. 5 (1970) 721
23. Mardare D., Tasca M., Delibas M., and Rusu G.I. Appl. Surf. Sci. 156 (2000) 200-206
24. Joshi G.P., Saxena N.S., Mangal R., Mishra A., and Sharma T.P. Bull. Mater. Sci. 26 (2003) 387-389