Plasma wall interaction for TiNx film deposition in a hollow cathode arc discharge

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 381-385

  Eggs, C ^a   Kersten, H ^a   Wagner, H E ^a   Wulff, H ^a  

^a EMA Universität   (Germany)

Author keywords

Film microstructure; Plasma parameters; TiN

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; ION BOMBARDMENT; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; REFLECTOMETERS; SILICON WAFERS; THIN FILMS; X RAY CRYSTALLOGRAPHY; X RAY PHOTOELECTRON SPECTROSCOPY;

HOLLOW CATHODE ARC DISCHARGES; LANGMUIR PROBE MEASUREMENTS; PLASMA WALL INTERACTIONS; X RAY REFLECTOMETRY;

TITANIUM NITRIDE;

EID: 0030397791     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09125-0     Document Type: Article

References (18)

1. H. Steffen and H. Wulff, Thin Solid Films, 263 (1995) 18.
2. H. Wulff, J. Klimke, H. Steffen and C. Eggs, Thin Solid Films, 261 (1995) 25.
3. S. Wouters, S. Kadlec, C. Quaeyhaegens and L.M. Stals, Thin Solid Films, accepted.
4. H. Steffen, H. Kersten and H. Wulff, J. Vac. Sci. Technol. A, 12 (1994) 2780.
5. A. Lunk, Vacuum, 41 (1985) 7.
6. J. Rohmannand S. Klagge, Contrib. Plasma Phys., 33 (1993) 111.
7. Handbook of X-ray photoelectron spectroscopy, J. Chastian (ed.), Perkin-Elmer Corp., Eden Prairie, Minnesota, 1992.
8. P. Klimanek, Mat. Sci. Forum, 79-82 (1991) 73.
9. E.A. Faulkner, Phil. Mag., 5 (1960) 519.
10. H. Wulff and C. Eggs, J. Vac. Sci. Technol. A, to be published.
11. P. Ehrlich, Anorg. Chem., 259 (1949) 1.
12. P. Čapková, P. Karen and L. Dobiasova, Cryst. Res. Technol., 21 (1985) 735.
13. B.E. Warren, Progr. Metal Phys., 9 (1969) 147.
14. M. Wilkens, Phys. Stat. Sol., (a) 2 (1970) 359.
15. P. Klimanek, Freiberger Forschungshefte, B 265 (1988) 76.
16. H. Wulff, A. Lunk and R. Basner, Vacuum, 41 (1990) 2201.
17. H. Kersten, H. Steffen, D. Vender and H.-E. Wagner, Vacuum, 46 (1995) 305.
18. V. Krasemann, Diploma, University Greifswald, 1993.