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Volumn 518, Issue 8, 2010, Pages 1962-1965
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Hysteresis behaviour of reactive high power impulse magnetron sputtering
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Author keywords
High Power Impulse Magnetron Sputtering; Plasma optical emission monitoring; Process control; Reactive sputtering
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Indexed keywords
AVERAGE POWER;
DIRECT CURRENT MAGNETRON SPUTTERING;
DUTY CYCLES;
HIGH POWER IMPULSE MAGNETRON SPUTTERING;
HYSTERESIS BEHAVIOUR;
HYSTERESIS CURVE;
HYSTERESIS EFFECT;
MONITORING AND CONTROL;
OXIDATION MECHANISMS;
PLASMA EMISSION MONITORING;
PULSE VOLTAGE;
HYSTERESIS;
ION IMPLANTATION;
LIGHT EMISSION;
MAGNETRON SPUTTERING;
PROCESS CONTROL;
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EID: 74249115818
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.12.011 Document Type: Letter |
Times cited : (34)
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References (17)
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