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Volumn 518, Issue 8, 2010, Pages 1962-1965

Hysteresis behaviour of reactive high power impulse magnetron sputtering

Author keywords

High Power Impulse Magnetron Sputtering; Plasma optical emission monitoring; Process control; Reactive sputtering

Indexed keywords

AVERAGE POWER; DIRECT CURRENT MAGNETRON SPUTTERING; DUTY CYCLES; HIGH POWER IMPULSE MAGNETRON SPUTTERING; HYSTERESIS BEHAVIOUR; HYSTERESIS CURVE; HYSTERESIS EFFECT; MONITORING AND CONTROL; OXIDATION MECHANISMS; PLASMA EMISSION MONITORING; PULSE VOLTAGE;

EID: 74249115818     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.011     Document Type: Letter
Times cited : (34)

References (17)
  • 8
    • 74249087300 scopus 로고    scopus 로고
    • U.S. Patent application No. 2009173622 A1, 9 Jul. 2009
    • J. Weichart, S. Kadlec, M. Elghazzali, U.S. Patent application No. 2009173622 (A1), 9 Jul. 2009.
    • Weichart, J.1    Kadlec, S.2    Elghazzali, M.3
  • 17
    • 74249101087 scopus 로고    scopus 로고
    • M. Audronis, V. Bellido-Gonzalez, B. Daniel, (UK patent application) GB0916417.9, 21 Sep. 2009.
    • M. Audronis, V. Bellido-Gonzalez, B. Daniel, (UK patent application) GB0916417.9, 21 Sep. 2009.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.