Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process

Applied Surface Science

Volumn 253, Issue 12, 2007, Pages 5312-5316

  Chappé, Jean Marie ^a   Martin, Nicolas ^a   Lintymer, Jan ^a   Sthal, Fabrice ^b   Terwagne, Guy ^c   Takadoum, Jamal ^a  

^a Centre National de la Recherche Scientifique   (France)

^b FEMTO ST INSTITUTE   (France)

^c UNIVERSITY OF NAMUR   (Belgium)

Author keywords

Reactive gas pulsing process; Reactive sputtering; Thin films; Titanium oxynitride

Indexed keywords

OXYGEN; REACTIVE SPUTTERING; SPUTTER DEPOSITION; TITANIUM COMPOUNDS;

DUTY CYCLE; METALLOID CONCENTRATION; REACTIVE GAS PULSING PROCESS (RGPP);

THIN FILMS;

EID: 33847636673     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.12.004     Document Type: Article

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