Characteristics of N-doped titanium oxide prepared by the large scaled DC reactive magnetron sputtering technique

Separation and Purification Technology

Volumn 58, Issue 1, 2007, Pages 200-205

  Park, Sang Won ^a   Heo, Jae Eun ^a  

^a Keimyung University   (South Korea)

Author keywords

Glow discharge; N doped TiO2 thin film; Photocatalysis; Reactive magnetron sputtering

Indexed keywords

BINDING ENERGY; CRYSTAL STRUCTURE; GLOW DISCHARGES; HYSTERESIS; MAGNETRON SPUTTERING; PARTICLE SIZE; PHOTOCATALYSIS; SURFACE ROUGHNESS; THIN FILMS;

CYLINDRICAL STRUCTURES; DISCHARGE VOLTAGE; PRACTICAL APPLICATION; REACTIVE MAGNETRON SPUTTERING; RUTILE PHASE;

TITANIUM OXIDES;

EID: 35349019932     PISSN: 13835866     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.seppur.2007.07.033     Document Type: Article

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