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Volumn 91, Issue 10, 2008, Pages 3167-3172

Heavily nitrogen-doped dual-phase titanium oxide thin films by reactive sputtering and rapid thermal annealing

Author keywords

[No Author keywords available]

Indexed keywords

DOPANT CONCENTRATIONS; LOW TEMPERATURES; NITROGEN-DOPED; NON-EQUILIBRIUM; THERMAL ANNEALING; TITANIUM OXIDE THIN FILMS;

EID: 53349128125     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2008.02608.x     Document Type: Article
Times cited : (30)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.