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Volumn 204, Issue 12-13, 2010, Pages 1907-1913

A unique approach to reveal the nanocomposite nc-MN/SiN-layer architecture of thin films via electrical measurements

Author keywords

Electrical conductivity; Metallic nitride; Nanocomposite; SiN

Indexed keywords

AMORPHOUS PHASE; CHEMICAL COMPOSITIONS; CHEMICAL INERTNESS; DEPOSITION CONDITIONS; ELECTRICAL AND MECHANICAL PROPERTIES; ELECTRICAL CONDUCTIVITY; ELECTRICAL MEASUREMENT; ELECTRICAL RESISTIVITY; EXPERIMENTAL DETERMINATION; GRAIN SURFACE; HIGH DEPOSITION RATES; LOW TEMPERATURES; METALLIC NITRIDE; NANOCOMPOSITE FILM; NANOCOMPOSITE MATERIALS; NANOCOMPOSITE THIN FILMS; NITROGEN PRESSURE; SMALL CONCENTRATION; TEM; TERNARY PHASE; THERMAL STABILITY; THIN LAYERS; TRANSITION METAL NITRIDES;

EID: 76349096472     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.11.045     Document Type: Article
Times cited : (12)

References (40)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.