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Volumn 204, Issue 12-13, 2010, Pages 1907-1913
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A unique approach to reveal the nanocomposite nc-MN/SiN-layer architecture of thin films via electrical measurements
b
EPFL
(Switzerland)
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Author keywords
Electrical conductivity; Metallic nitride; Nanocomposite; SiN
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Indexed keywords
AMORPHOUS PHASE;
CHEMICAL COMPOSITIONS;
CHEMICAL INERTNESS;
DEPOSITION CONDITIONS;
ELECTRICAL AND MECHANICAL PROPERTIES;
ELECTRICAL CONDUCTIVITY;
ELECTRICAL MEASUREMENT;
ELECTRICAL RESISTIVITY;
EXPERIMENTAL DETERMINATION;
GRAIN SURFACE;
HIGH DEPOSITION RATES;
LOW TEMPERATURES;
METALLIC NITRIDE;
NANOCOMPOSITE FILM;
NANOCOMPOSITE MATERIALS;
NANOCOMPOSITE THIN FILMS;
NITROGEN PRESSURE;
SMALL CONCENTRATION;
TEM;
TERNARY PHASE;
THERMAL STABILITY;
THIN LAYERS;
TRANSITION METAL NITRIDES;
CHEMICAL STABILITY;
CRYSTALLITES;
ELECTRIC PROPERTIES;
ELECTRON ENERGY LEVELS;
MECHANICAL PROPERTIES;
MONOLAYERS;
NANOCOMPOSITES;
SILICON NITRIDE;
SURFACE CHEMISTRY;
THIN FILMS;
TITANIUM NITRIDE;
TRANSITION METALS;
ELECTRIC CONDUCTIVITY OF SOLIDS;
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EID: 76349096472
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.11.045 Document Type: Article |
Times cited : (12)
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References (40)
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