Influence of the silicon concentration on the optical and electrical properties of reactively sputtered Zr-Si-N nanocomposite coatings

Materials Science and Engineering: B

Volumn 131, Issue 1-3, 2006, Pages 36-39

  Pilloud, D ^a   Pierson, J F ^b   Pichon, L ^c  

^a FEMTO ST INSTITUTE   (France)

^b INSTITUT JEAN LAMOUR   (France)

^c UNIVERSITÉ DE POITIERS   (France)

Author keywords

Electrical properties; Nanocomposite; Optical properties; Reactive sputtering

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; ELLIPSOMETRY; METALLIC FILMS; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SPUTTERING; STEEL; SUBSTRATES;

ELECTRICAL PROPERTIES; NANOCOMPOSITE; OPTICAL ABSORPTIONS; REACTIVE SPUTTERING;

SILICONE COATINGS;

EID: 33745929673     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2006.03.017     Document Type: Article

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