Formation of composite ternary nitride thin films by magnetron sputtering co-deposition

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4083-4089

  Sandu, C S ^a   Sanjines R ^a   Benkahoul, M ^a   Medjani, F ^a   Levy F ^a  

^a EPFL   (Switzerland)

Author keywords

Nanocomposite; Sputtering; Structural properties; Ternary nitride

Indexed keywords

MAGNETRON SPUTTERING; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PROTECTIVE COATINGS; SOLUBILITY; SPUTTER DEPOSITION; TERNARY SYSTEMS; TRANSITION METAL ALLOYS;

COMPOSITE NITRIDE THIN FILMS; NANOCRYSTALLINE COMPOSITE FILMS; RESISTIVITY MEASUREMENTS;

THIN FILMS;

MAGNETRON SPUTTERING; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PROTECTIVE COATINGS; SOLUBILITY; SPUTTER DEPOSITION; TERNARY SYSTEMS; THIN FILMS; TRANSITION METAL ALLOYS;

EID: 33751247634     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.100     Document Type: Article

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