Effect of bias voltage on the structure and hardness of Ti‒Si‒N composite coatings synthesized by cathodic arc assisted middle-frequency magnetron sputtering

Journal of Alloys and Compounds

Volumn 473, Issue 1-2, 2009, Pages 437-441

  Yang, Z T ^a   Yang, B ^a   Guo, L P ^a   Fu, D J ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

Bias voltage; Hardness; Microstructure; Ti single bond Si single bond N composite coatings

Indexed keywords

BIAS VOLTAGE; HARDNESS; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; SILICON COMPOUNDS; SURFACE MORPHOLOGY; TITANIUM NITRIDE;

CATHODIC ARC; CRYSTALLINE GRAIN SIZE; INDUSTRIAL SCALE; MAGNETRON SPUTTERING SYSTEMS; NANO-COMPOSITE COATING; NC-TIN/A-SI3N4; SINGLE BOND; SUBSTRATE BIAS VOLTAGES;

COMPOSITE COATINGS;

EID: 61349123738     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.06.003     Document Type: Article

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