Structure, morphology and electrical properties of sputtered Zr-Si-N thin films: From solid solution to nanocomposite

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4219-4223

  Sandu, C S ^a   Medjani, F ^a   Sanjines R ^a   Karimi, A ^a   Levy F ^a  

^a EPFL   (Switzerland)

Author keywords

Grain boundary; Morphology; Nanocomposite; Ternary nitride

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MORPHOLOGY; NANOSTRUCTURED MATERIALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SPUTTERED THIN FILMS; TERNARY NITRIDE; THIN FILMS DEPOSITION;

ZIRCONIUM ALLOYS;

CRYSTAL STRUCTURE; DEPOSITION; ELECTRIC PROPERTIES; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MORPHOLOGY; NANOSTRUCTURED MATERIALS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM ALLOYS;

EID: 33751200961     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.002     Document Type: Article

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