Relationship between the physical and structural properties of Nb z Si y N x thin films deposited by dc reactive magnetron sputtering

Journal of Applied Physics

Volumn 98, Issue 12, 2005, Pages

  Sanjins R ^a   Benkahoul, M ^a   Sandu, C S ^a   Schmid, P E ^a   Lvy F ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

GRAIN BOUNDARY SCATTERING; GRAIN-BOUNDARY SCATTERING; NBN CRYSTALLITES; SI CONTENT (CSI);

ELECTRIC CONDUCTIVITY; ELECTRIC PROPERTIES; ELLIPSOMETRY; GRAIN BOUNDARIES; MAGNETRON SPUTTERING; MATHEMATICAL MODELS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; PLASMA OSCILLATIONS; SCATTERING; THIN FILMS;

NIOBIUM ALLOYS;

EID: 29744433800     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2149488     Document Type: Review

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