Nanostructure formation during deposition of TiN SiNx nanomultilayer films by reactive dual magnetron sputtering

Journal of Applied Physics

Volumn 97, Issue 11, 2005, Pages

  Söderberg, Hans ^a   Od́n, Magnus ^a   Molina Aldareguia, Jon M ^b,c   Hultman, Lars ^c  

^a LULEÅ UNIVERSITY OF TECHNOLOGY   (Sweden)

^b CEIT   (Spain)

^c LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

COHERENCY STRESS; EPITAXIAL STABILIZATION; MULTILAYERED FILMS; POLYCRYSTALLINE MULTILAYERS;

CRYSTAL GROWTH; CRYSTALLINE MATERIALS; GRAIN BOUNDARIES; MAGNETRON SPUTTERING; MICROSTRUCTURE; MULTILAYERS; NUCLEATION; SILICON NITRIDE; SILICON WAFERS; THIN FILMS; TITANIUM NITRIDE;

NANOSTRUCTURED MATERIALS;

EID: 20544447475     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1935135     Document Type: Article

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