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Thin Solid Films

Volumn 496, Issue 2, 2006, Pages 336-341

Influence of Ge addition on the morphology and properties of TiN thin films deposited by magnetron sputtering

(6) Sandu, C S a Sanjines R a Benkahoul, M a Parlinska Wojtan, M a Karimi, A a Levy F a

a Ceramics Laboratory Ecole Polytechnique Federale de Lausanne (Switzerland)

Author keywords

Film nanostructure; Sputtering; Structural properties; Titanium nitride

Indexed keywords

CHEMICAL BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; GERMANIUM; LARGE SCALE SYSTEMS; MAGNETRON SPUTTERING; PROTECTIVE COATINGS; SEGREGATION (METALLOGRAPHY); SPUTTER DEPOSITION; TERNARY SYSTEMS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

FILM NANOSTRUCTURES; NANOCOMPOSITE FILMS; STRUCTURAL PROPERTIES;

THIN FILMS;

EID: 28144462773 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.09.154 Document Type: Article

Times cited : (16)

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