|
Volumn 201, Issue 6, 2006, Pages 2897-2903
|
Model for the evolution of Nb-Si-N thin films as a function of Si content relating the nanostructure to electrical and mechanical properties
a
EPFL
(Switzerland)
|
Author keywords
Morphology; Nanocomposite; Resistivity; Ternary nitride
|
Indexed keywords
ELECTRIC PROPERTIES;
HARDNESS;
MAGNETRON SPUTTERING;
MECHANICAL PROPERTIES;
MORPHOLOGY;
NANOSTRUCTURED MATERIALS;
SPUTTER DEPOSITION;
STRESSES;
TERNARY SYSTEMS;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
NANOCRYSTALLITES;
SUBSTRATE TEMPERATURE;
NIOBIUM ALLOYS;
ELECTRIC PROPERTIES;
HARDNESS;
MAGNETRON SPUTTERING;
MECHANICAL PROPERTIES;
MORPHOLOGY;
NANOSTRUCTURED MATERIALS;
NIOBIUM ALLOYS;
SPUTTER DEPOSITION;
STRESSES;
TERNARY SYSTEMS;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
|
EID: 33751019146
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.06.003 Document Type: Article |
Times cited : (52)
|
References (21)
|