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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 3, 2002, Pages 823-828

Microstructure and mechanical properties of Zr-Si-N films prepared by rf-reactive sputtering

(5) Nose, M a Chiou, W A a Zhou, M b Mae, T c Meshii, M a

a Northwestern University (United States)

b OSAKA UNIVERSITY (Japan)

c TOYAMA NATIONAL COLLEGE OF TECHNOLOGY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; DEPOSITION; HIGH RESOLUTION ELECTRON MICROSCOPY; MECHANICAL PROPERTIES; METALLIC FILMS; MICROANALYSIS; MICROSTRUCTURE; SILICON WAFERS; SPUTTERING; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRON PROBE MICROANALYZER; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NANOINDENTATION; POINT TO POINT RESOLUTION; REACTIVE SPUTTERING; ZIRCONIUM SILICON NITRIDE FILM;

ZIRCONIUM COMPOUNDS;

EID: 0036565398 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1468657 Document Type: Article

Times cited : (70)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.