Structural transitions in hard Si-based TiN coatings: The effect of bias voltage and temperature

Surface and Coatings Technology

Volumn 146-147, Issue , 2001, Pages 274-279

  Vaz, F ^a   Rebouta, L ^a   Goudeau, Ph ^b   Girardeau, T ^b   Pacaud, J ^b   Riviere J P ^b   Traverse, A ^c  

^a UNIVERSITY OF MINHO   (Portugal)

^b UNIVERSITÉ DE POITIERS   (France)

^c UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

EXAFS; Phase evolution; Surface mobility; TEM; Texture; Ti Si N; XRD

Indexed keywords

MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SILICON NITRIDE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

STRUCTURAL TRANSITIONS;

INORGANIC COATINGS;

FILM;

EID: 0035465603     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01395-0     Document Type: Article

References (23)