Influence of bias voltage on the microstructure and physical properties of magnetron sputtered Zr-Si-N nanocomposite thin films

Surface and Coatings Technology

Volumn 204, Issue 6-7, 2009, Pages 969-972

  Sandu, C S ^a   Cusnir, N ^b   Oezer, D ^b   Sanjines R ^b   Patscheider, J ^c  

^a STI   (Switzerland)

^b EPFL   (Switzerland)

^c SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Morphology; Nanocomposite; Thin films; Zirconium nitride

Indexed keywords

COLUMNAR STRUCTURES; FILM TEXTURES; GRAIN SIZE; ION BOMBARDMENT ENERGY; IONIC SPECIES; NANOCOMPOSITE THIN FILMS; NEGATIVE BIAS; NEGATIVE POTENTIAL; REACTIVE MAGNETRON SPUTTERING; SI CONTENT; SI SURFACES; SUBSTRATE TEMPERATURE; X-RAY DIFFRACTION MEASUREMENTS; ZIRCONIUM NITRIDE; ZR-SI-N FILMS;

BIAS VOLTAGE; GRAIN SIZE AND SHAPE; ION BOMBARDMENT; IONS; MAGNETRONS; MICROCRYSTALLINE SILICON; MORPHOLOGY; NANOCOMPOSITES; SILICON; SILICON NITRIDE; SUBSTRATES; THIN FILMS; ZIRCONIUM;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 72149084628     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.06.042     Document Type: Article

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