A new visible photoluminescence in the conducting Ta-Si-N nanocomposite thin films

Journal of Luminescence

Volumn 129, Issue 4, 2009, Pages 370-375

  Chung, C K ^a   Chen, T S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Conducting; Nanostructure; Photoluminescence; PVD; Ta Si N

Indexed keywords

AMORPHOUS MATERIALS; AMORPHOUS SILICON; AUGER ELECTRON SPECTROSCOPY; COLOR FILMS; CONDUCTIVE FILMS; FILMS; LIGHT EMISSION; LUMINESCENCE; MICROCRYSTALLINE SILICON; NANOCOMPOSITES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; PHOTOLUMINESCENCE; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICON; TANTALUM ALLOYS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS MATRIXES; AUGER ELECTRON SPECTROSCOPY DEPTH PROFILES; CONDUCTING; LOW RESISTIVITIES; NANOCOMPOSITE THIN FILMS; NANOCRYSTALLINE GRAINS; PL INTENSITIES; PL MECHANISMS; POLYCRYSTALLINE FILMS; PVD; ROOM TEMPERATURES; TA-SI-N; X-RAY DIFFRACTIONS;

TANTALUM;

EID: 58149480344     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2008.11.003     Document Type: Article

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