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Volumn 107, Issue 2, 2010, Pages

High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics

(2) Wang, Mingmei a Kushner, Mark J b

a Iowa State University (United States)

b UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGULAR SPREADS; B-Y IONS; BEAM ENERGIES; CAPACITIVELY COUPLED PLASMAS; COMPUTATIONAL INVESTIGATION; DC BIAS VOLTAGE; FEATURE SIZES; FLUOROCARBON GAS; HIGH ASPECT RATIO; HIGH-ASPECT-RATIO-ETCHING; HIGH-ENERGY ELECTRON; ION CHARGING; ION ENERGIES; LATERAL ELECTRIC FIELD; PLASMA PARTICLES; POSITIVE CHARGES; RF BIAS; TRAP CHARGE; VOLTAGE CONSTANTS;

BIAS VOLTAGE; ELECTRIC FIELDS; FLUOROCARBONS; GAS MIXTURES; HIGH ENERGY PHYSICS; INDUCTIVELY COUPLED PLASMA; IONS; LITHIUM COMPOUNDS; PHOTORESISTS; PLASMA ETCHING; PRESSURE DROP; SILICON COMPOUNDS;

ASPECT RATIO;

EID: 75749135332 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3290873 Document Type: Article

Times cited : (82)

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