Negative charge injection to a wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching; diagnostics by emission-selected computerized tomography

Journal of Physics D: Applied Physics

Volumn 37, Issue 16, 2004, Pages 2223-2231

  Ohmori, Takeshi ^a   Goto, Takeshi ^a   Makabe, Toshiaki ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTERIZED TOMOGRAPHY; DISSOCIATION; INTERFACES (MATERIALS); SHRINKAGE; SILICA; SILICON WAFERS; SURFACE CHEMISTRY; ULSI CIRCUITS;

CAPACITIVELY COUPLED PLASMAS (CCP); CHARGE INJECTION; PLASMA PROCESSING;

PLASMA ETCHING;

EID: 4344580719     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/16/003     Document Type: Article

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