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Plasma Sources Science and Technology

Volumn 17, Issue 4, 2008, Pages

Secondary electrons in rf and dc/rf capacitive discharges

(3) Kawamura, E a Lichtenberg, A J a Lieberman, M A a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

2D SIMULATIONS; ANALYTIC MODELS; ANALYTICAL RESULTS; CAPACITIVE DISCHARGES; DC VOLTAGE; DC VOLTAGE SOURCES; DENSITY REGIME; DISCHARGE EFFICIENCY; ENERGY DISTRIBUTIONS; NUMERICAL SIMULATION; PARTICLE-IN-CELL CODE; PIC SIMULATION; SECONDARY ELECTRONS; SUBSTRATE ELECTRODES; UNIFORMITY CONTROL;

ANGULAR DISTRIBUTION; ELECTRONS; PLASMA SHEATHS; SECONDARY EMISSION; SIGNAL INTERFERENCE;

ELECTRIC DISCHARGES;

EID: 67649861032 PISSN: 09630252 EISSN: 13616595 Source Type: Journal
DOI: 10.1088/0963-0252/17/4/045002 Document Type: Article

Times cited : (58)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.