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Volumn 15, Issue 1, 2008, Pages

Ion orbits in plasma etching of semiconductors

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; PHOTORESISTS; PLASMA SHEATHS; SEMICONDUCTOR MATERIALS;

EID: 38849194629     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2819681     Document Type: Article
Times cited : (8)

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    • Handbook of Plasma Processing Technology: Fundamentals, Etching, Deposition, and Surface Interactions (William Andrew Publishing/Noyes, New York).
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    • (1990)
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  • 5
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    • Rogers, B.R.1    Cale, T.S.2
  • 6
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  • 7
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    • Plasma Physics and Controlled Fusion (Plenum, New York).
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    • Chen, F.F.1
  • 8
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    • K. Hashimoto, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.33.6013 33, 6013 (1994).
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    • VACUAV 0042-207X 10.1016/S0042-207X(98)00249-8.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.