Test particle simulation of the role of ballistic electrons in hybrid dc/rf capacitively coupled plasmas in argon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 6, 2008, Pages 1415-1424

  Denpoh, K ^a   Ventzek, P L G ^a  

^a TOKYO ELECTRON LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMS; BALLISTICS; CARRIER CONCENTRATION; CONSTRUCTION EQUIPMENT; ELECTRIC FIELDS; ELECTRIC POWER MEASUREMENT; ELECTROLYSIS; ELECTRON DENSITY MEASUREMENT; ETCHING; EXPLOSIVES; INDUCTIVELY COUPLED PLASMA; INERT GASES; IONIZATION; KINETIC THEORY; PLASMA ETCHING; PLASMA SOURCES; PLASMAS; RATE CONSTANTS;

BALLISTIC ELECTRONS; BULK ELECTRONS; CAPACITIVELY COUPLED PLASMAS; DC BIASES; DC POWERS; DC SOURCES; DUAL MODES; ELECTRON DENSITIES; EQUIPMENT TECHNOLOGIES; HIGH ENERGIES; HIGH IONIZATIONS; IONIZATION RATES; LOW FREQUENCIES; MEASURED DATUMS; POTENTIAL WELLS; RF BIASES; RF POWERS; SECONDARY ELECTRONS; SEMICONDUCTOR MANUFACTURING; TEST PARTICLES; TOTAL FLUXES; VHF POWERS;

ELECTRONS;

EID: 55349145247     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2981064     Document Type: Article

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