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Volumn 61, Issue 62, 2002, Pages 835-847
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The role of mask charging in profile evolution and gate oxide degradation
a a b |
Author keywords
Gate oxide damage; Mask charging; Plasma etching; Profile evolution
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Indexed keywords
ASPECT RATIO;
COMPUTER SIMULATION;
DEGRADATION;
ELECTRIC CHARGE;
ELECTRIC CONDUCTANCE;
ELECTRIC FIELDS;
GATES (TRANSISTOR);
IONS;
MICROSTRUCTURE;
OXIDES;
PLASMA ETCHING;
MASK CHARGING;
MASKS;
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EID: 0036643807
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(02)00459-8 Document Type: Article |
Times cited : (14)
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References (11)
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