Mitigation of accumulated electric charge by deposited fluorocarbon film during SiO2 etching

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 433-436

  Shimmura, Tadashi ^a   Suzuki, Yuya ^a   Soda, Sinnosuke ^a   Samukawa, Seiji ^a   Koyanagi, Mitsumasa ^a   Hane, Kazuhiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CHARGE; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTROCHEMICAL ELECTRODES; INTEGRATED CIRCUIT MANUFACTURE; ION BOMBARDMENT; PLASMA ETCHING; SILICA; SILICON WAFERS; THIN FILMS;

MICROTRENCHING; PLASMA EXPOSURE;

FLUOROCARBONS;

EID: 1842556136     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1649347     Document Type: Article

References (16)

1. T. Nozawa and T. Kinoshita, Jpn. J. Appl. Phys. 34, 2107 (1995).
2. T. Kinoshita, M. Hane, and J. P. Mavittee, J. Vac. Sci. Technol. B 14, 560 (1996).
3. H. Ootera, Jpn. J. Appl. Phys. 33, 6109 (1993).
4. S. Samikawa and T. Mukai, J. Vac. Sci. Technol. B 18, 166 (2000).
5. P. Berruyer, F. Vinet, H. Feldis, R. Blanc, M. Lerme, Y. Morand, and T. Poiroux, J. Vac. Sci. Technol. A 16, 1604 (1998).
6. T. Ohiwa, A. Kojima, M. Sekine, I. Sakai, S. Yonemoto, and Y. Watanabe, Jpn. J. Appl. Phys. 37, 5060 (1998).
7. S. C. McNevin and M. Cerullo, J. Vac. Sci. Technol. A 16, 1514 (1998).
8. T. Tatsumi, Y. Hikosaka, S. Morishita, M. Matsui, and M. Sekine, J. Vac. Sci. Technol. A 17, 1562 (1999).
9. J. W. Coburn and H. F. Winters, Appl. Phys. Lett. 55, 2730 (1989).
10. E. S. G. Shaqfeh and C. W. Jurgensen, J. Appl. Phys. 66, 4664 (1989).
11. K. P. Giapis, G. R. Scheller, R. A. Gottscho, W. S. Horioka, and Y. H. Lee, Appl. Phys. Lett. 57, 983 (1990).
12. J. C. Armond and H. H. Sawin, J. Appl. Phys. 70, 5314 (1991).
13. S. G. Ingram, J. Appl. Phys. 68, 500 (1990).
14. J. Matsui, N. Nakano, Z. L. Petrovic, and T. Makabe, Appl. Phys. Lett. 78, 883 (2001).
15. T. Shimmura, S. Soda, S. Samukawa, M. Koyanagi, and K. Hane, J. Vac. Sci. Technol. B 20, 2346 (2002).
16. S. Samukawa, Y. Nakagawa, T. Tsukada, H. Ueyama, and K. Shinohara, Jpn. J. Appl. Phys. 34, 6805 (1995).