How tunneling currents reduce plasma-induced charging

Applied Physics Letters

Volumn 71, Issue 20, 1997, Pages 2928-2930

  Hwang, Gyeong S ^a   Giapis, Konstantinos P ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3643106494     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120218     Document Type: Article

References (15)

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14. ox decreases, the entrance potential becomes more negative, thus preventing more plasma electrons from entering the trench.
15. Variation of the plasma conditions and if bias in the typical regime for high-density plasmas does not change the location of the transition. The same is true for a slightly higher energy threshold to reaction, to account for the use of oxygen in the experiment.