High energy electron fluxes in dc-augmented capacitively coupled plasmas I. Fundamental characteristics

Journal of Applied Physics

Volumn 107, Issue 2, 2010, Pages

  Wang, Mingmei ^a   Kushner, Mark J ^b  

^a Iowa State University   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATED ELECTRONS; ANGULAR SPREADS; CAPACITIVELY COUPLED PLASMAS; COMPUTATIONAL STUDIES; DC BIAS; DC CURRENT; FUNDAMENTAL CHARACTERISTICS; GROUND PLANES; HIGH-ENERGY BEAMS; HIGH-ENERGY ELECTRON; MICROELECTRONICS FABRICATION; POWER DEPOSITION; RF BIAS; RF ELECTRODES; RF VOLTAGE; SECONDARY ELECTRONS; SIDE WALLS; STOCHASTIC HEATING;

CONDUCTING POLYMERS; HEATING; HIGH ENERGY PHYSICS; INDUCTIVELY COUPLED PLASMA; IONIZATION OF GASES; MICROELECTRONICS; ORGANIC CONDUCTORS; WALL FLOW;

ELECTRONS;

EID: 75749090472     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3290870     Document Type: Article

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