Profile simulation of high aspect ratio contact etch

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 4874-4878

  Kim, Doosik ^a   Hudson, Eric A ^a   Cooperberg, David ^a   Edelberg, Erik ^a   Srinivasan, Mukund ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

Etch profile; High aspect ratio contact; Plasma etch; Profile simulation

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; DEPOSITION; PHOTORESISTS; SCATTERING; SILICA;

ETCH PROFILES; HIGH ASPECT RATIO CONTACTS; PROFILE SIMULATION; SURFACE SCATTERING;

PLASMA ETCHING;

EID: 33947140175     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.023     Document Type: Article

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