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Volumn 79, Issue 12, 1996, Pages 9353-9360

Mass spectrometric measurements of neutral reactant and product densities during Si etching in a high-density helical resonator Cl2 plasma

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0011452551     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362613     Document Type: Article
Times cited : (52)

References (30)
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    • 85033866996 scopus 로고    scopus 로고
    • private communication
    • J. D. Bukowski and D. B. Graves (private communication); J. D. Bukowski, P. Vitello, and D. B. Graves, 42nd National Symposium of the American Vacuum Society, Minneapolis, MN, 16-20 October, 1995 (unpublished).
    • Bukowski, J.D.1    Graves, D.B.2
  • 14
    • 85033838945 scopus 로고    scopus 로고
    • private communication
    • H. Anderson (private communication).
    • Anderson, H.1
  • 21
    • 5344269701 scopus 로고
    • D. E. Ibbotson and C. P. Chang, in Dry Etch Technology, edited by D. Ranadive [Proc. SPIE 1593, 130 (1991)].
    • (1991) Proc. SPIE , vol.1593 , pp. 130
  • 26
    • 85033833337 scopus 로고    scopus 로고
    • private communication
    • I. Nishiyama (private communication); J. Appl. Phys. (in press).
    • Nishiyama, I.1
  • 27
    • 85033839121 scopus 로고    scopus 로고
    • in press
    • I. Nishiyama (private communication); J. Appl. Phys. (in press).
    • J. Appl. Phys.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.