Molecular dynamics for low temperature plasma-surface interaction studies

Journal of Physics D: Applied Physics

Volumn 42, Issue 19, 2009, Pages

  Graves, David B ^a   Brault, Pascal ^a  

^a UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BOND-BREAKING; CARBON IONS; CHEMICAL INTERACTIONS; CURRENT STATUS; ENERGETIC SPECIES; HYDROGENATED SILICON; INTERATOMIC POTENTIAL; LOW TEMPERATURE PLASMAS; MATERIAL PROCESSING TECHNOLOGY; MD SIMULATION; MOLECULAR DYNAMICS SIMULATIONS; RADICAL SPECIES; SILICON NANOPARTICLES; TETRAHEDRAL AMORPHOUS CARBON FILMS;

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMS; CARBON FILMS; EQUATIONS OF MOTION; MOLECULAR DYNAMICS; PLASMA DEPOSITION; PLASMA ETCHING; PLASMA INTERACTIONS; SURFACE CHEMISTRY; SURFACES; TOKAMAK DEVICES;

AMORPHOUS SILICON;

EID: 70350655451     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/19/194011     Document Type: Article

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