Molecular dynamics simulations of Si etching by energetic CF+3

Journal of Applied Physics

Volumn 86, Issue 11, 1999, Pages 5938-5948

  Abrams, Cameron F ^a   Graves, David B ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000892440     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371637     Document Type: Article

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