Molecular dynamics simulation analyses on injection angle dependence of SiO2 sputtering yields by fluorocarbon beams

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 4883-4886

  Kawase, Tomohito ^a   Hamaguchi, Satoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Fluorocarbon; Molecular dynamics simulations; Plasma etching; Plasma surface interaction

Indexed keywords

COMPUTER SIMULATION; FLUOROCARBONS; MOLECULAR DYNAMICS; PLASMA ETCHING; SILICA;

ATOMIC COMPOSITIONS; MOLECULAR DYNAMICS SIMULATIONS; PLASMA SURFACE INTERACTION; SPUTTERED SPECIES;

SPUTTER DEPOSITION;

EID: 33947119110     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.024     Document Type: Article

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