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Volumn 496, Issue 3, 2002, Pages 271-286
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Computed energetics for etching of the Si(1 0 0) surface by F and Cl atoms
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Author keywords
Chlorine; Density functional calculations; Etching; Halogens; Models of surface chemical reactions; Silicon; Single crystal surfaces; Solid gas interfaces
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Indexed keywords
ATOMS;
BINDING ENERGY;
CHEMICAL BONDS;
CHLORINE;
DIMERS;
ETCHING;
FLUORINE;
MATHEMATICAL MODELS;
NUCLEAR ENERGY;
PHASE INTERFACES;
PROBABILITY DENSITY FUNCTION;
SINGLE CRYSTALS;
SURFACE STRUCTURE;
CRYSTALLINE SILICON;
ENERGETICS;
SILICON;
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EID: 0037050230
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(01)01381-4 Document Type: Article |
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Times cited : (19)
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References (35)
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