First-principles theoretical analysis of silyl radical diffusion on silicon surfaces

Journal of Chemical Physics

Volumn 125, Issue 10, 2006, Pages

  Bakos, Tamas ^a   Valipa, Mayur S ^a   Maroudas, Dimitrios ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR-DYNAMICS (MD) SIMULATIONS; RADICAL MIGRATION; SILICON SURFACES; SYNERGISTIC COMBINATION;

AMORPHOUS SILICON; DIFFUSION; HYDROGENATION; MOLECULAR DYNAMICS; PROBABILITY DENSITY FUNCTION; THERMOANALYSIS; THIN FILMS;

SILICON;

HYDROGEN; SILANE DERIVATIVE; SILICON DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; CONFORMATION; DIMERIZATION; PHYSICAL CHEMISTRY; SURFACE PROPERTY;

CHEMISTRY, PHYSICAL; DIMERIZATION; HYDROGEN; MODELS, MOLECULAR; MOLECULAR CONFORMATION; SILANES; SILICON COMPOUNDS; SURFACE PROPERTIES;

EID: 33748778503     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2345064     Document Type: Article

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