Effects of nitrogen flow rate on the preferred orientation and phase transition for niobium nitride films grown by direct current reactive magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 42, Issue 3, 2009, Pages

  Wen, M ^a   Hu, C Q ^a   Meng, Q N ^a   Zhao, Z D ^a   An, T ^a   Su, Y D ^a   Yu, W X ^a   Zheng, W T ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL STRESS; CRITICAL VALUES; DIRECT-CURRENTS; FACE-CENTRED CUBIC; NANO-INDENTATION MEASUREMENTS; NIOBIUM NITRIDE FILMS; NIOBIUM NITRIDES; NITROGEN FLOW RATES; PREFERRED ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; SI(1 0 0 ); SINGLE PHASE; X- RAY DIFFRACTIONS;

FLOW RATE; MAGNETRONS; MECHANICAL PROPERTIES; NIOBIUM; NITRIDES; SEMICONDUCTING SILICON COMPOUNDS; TRANSITION METALS;

PHASE TRANSITIONS;

EID: 63749091164     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/3/035304     Document Type: Article

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