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Thin Solid Films

Volumn 491, Issue 1-2, 2005, Pages 235-241

The growth and diffusion barrier properties of atomic layer deposited NbNx thin films

(5) Alén, Petra a Ritala, Mikko a Arstila, Kai a Keinonen, Juhani a Leskelä, Markku a

a UNIVERSITY OF HELSINKI (Finland)

Author keywords

ALD; Diffusion barrier; Niobium nitride

Indexed keywords

AMMONIA; DIFFUSION; ENERGY DISPERSIVE SPECTROSCOPY; GROWTH (MATERIALS); NIOBIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ALD; DIFFUSION BARRIER; NIOBIUM NITRIDE; PRECURSORS;

THIN FILMS;

EID: 25144522690 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.06.015 Document Type: Article

Times cited : (59)

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