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Volumn 95, Issue 4, 2004, Pages 2130-2134
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Effect of intrinsic stress on preferred orientation in AlN thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
CALCULATIONS;
CRYSTAL ORIENTATION;
DEPOSITION;
ELECTRON DIFFRACTION;
MICROSTRUCTURE;
STRESSES;
THIN FILMS;
TRANSMISSION ELECTRON MICROSCOPY;
CRYSTALLITES;
INTRINSIC STRESS;
ION IMPACT ENERGY;
PULSE BIAS;
ALUMINUM NITRIDE;
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EID: 1542348998
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1640462 Document Type: Article |
Times cited : (45)
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References (25)
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